Chlorophyll fluorescence imaging analysis for elucidating the mechanism of photosystem II acclimation to cadmium exposure in the hyperaccumulating plant Noccaea caerulescens
Publikation: Bidrag til tidsskrift › Tidsskriftartikel › Forskning › fagfællebedømt
Standard
Chlorophyll fluorescence imaging analysis for elucidating the mechanism of photosystem II acclimation to cadmium exposure in the hyperaccumulating plant Noccaea caerulescens. / Bayçu, Gülriz; Moustaka, Julietta; Gevrek, Nurbir; Moustakas, Michael.
I: Materials, Bind 11, Nr. 12, 2580, 18.12.2018, s. 1-14.Publikation: Bidrag til tidsskrift › Tidsskriftartikel › Forskning › fagfællebedømt
Harvard
APA
Vancouver
Author
Bibtex
}
RIS
TY - JOUR
T1 - Chlorophyll fluorescence imaging analysis for elucidating the mechanism of photosystem II acclimation to cadmium exposure in the hyperaccumulating plant Noccaea caerulescens
AU - Bayçu, Gülriz
AU - Moustaka, Julietta
AU - Gevrek, Nurbir
AU - Moustakas, Michael
PY - 2018/12/18
Y1 - 2018/12/18
N2 - We provide new data on the mechanism of Noccaea caerulescens acclimation to Cd exposure by elucidating the process of photosystem II (PSII) acclimation by chlorophyll fluorescence imaging analysis. Seeds from the metallophyte N. caerulescens were grown in hydroponic culture for 12 weeks before exposure to 40 and 120 μM Cd for 3 and 4 days. At the beginning of exposure to 40 μM Cd, we observed a spatial leaf heterogeneity of decreased PSII photochemistry, that later recovered completely. This acclimation was achieved possibly through the reduced plastoquinone (PQ) pool signaling. Exposure to 120 μM Cd under the growth light did not affect PSII photochemistry, while under high light due to a photoprotective mechanism (regulated heat dissipation for protection) that down-regulated PSII quantum yield, the quantum yield of non-regulated energy loss in PSII (Φ NO ) decreased even more than control values. Thus, N. caerulescens plants exposed to 120 μM Cd for 4 days exhibited lower reactive oxygen species (ROS) production as singlet oxygen ( 1 O 2 ). The response of N. caerulescens to Cd exposure fits the 'Threshold for Tolerance Model', with a lag time of 4 d and a threshold concentration of 40 μM Cd required for the induction of the acclimation mechanism.
AB - We provide new data on the mechanism of Noccaea caerulescens acclimation to Cd exposure by elucidating the process of photosystem II (PSII) acclimation by chlorophyll fluorescence imaging analysis. Seeds from the metallophyte N. caerulescens were grown in hydroponic culture for 12 weeks before exposure to 40 and 120 μM Cd for 3 and 4 days. At the beginning of exposure to 40 μM Cd, we observed a spatial leaf heterogeneity of decreased PSII photochemistry, that later recovered completely. This acclimation was achieved possibly through the reduced plastoquinone (PQ) pool signaling. Exposure to 120 μM Cd under the growth light did not affect PSII photochemistry, while under high light due to a photoprotective mechanism (regulated heat dissipation for protection) that down-regulated PSII quantum yield, the quantum yield of non-regulated energy loss in PSII (Φ NO ) decreased even more than control values. Thus, N. caerulescens plants exposed to 120 μM Cd for 4 days exhibited lower reactive oxygen species (ROS) production as singlet oxygen ( 1 O 2 ). The response of N. caerulescens to Cd exposure fits the 'Threshold for Tolerance Model', with a lag time of 4 d and a threshold concentration of 40 μM Cd required for the induction of the acclimation mechanism.
KW - Cd toxicity
KW - Detoxification mechanism
KW - Photochemical quenching
KW - Photoprotective mechanism
KW - Photosynthetic heterogeneity
KW - Phytoremediation
KW - Plastoquinone pool
KW - Redox state
KW - Spatiotemporal variation
UR - http://www.scopus.com/inward/record.url?scp=85058680729&partnerID=8YFLogxK
U2 - 10.3390/ma11122580
DO - 10.3390/ma11122580
M3 - Journal article
C2 - 30567339
AN - SCOPUS:85058680729
VL - 11
SP - 1
EP - 14
JO - Materials Transactions
JF - Materials Transactions
SN - 1345-9678
IS - 12
M1 - 2580
ER -
ID: 213857470